  Thin Films Laboratory (TFL) has been established in 2017 to enhance the institute (ISSP) focus on thin films science and technology. The Laboratory provides thin film deposition service of a wide variety of inorganic materials, using different deposition techniques from existing and new tools, including the PVD vacuum multifunctional R&D cluster SAF25/50, the magnetron sputtering G500M cluster including High Power Impulse Magnetron Sputtering (HiPIMS), as well as PLD, MOCVD and ALD. The deposition tools are operated by highly skilled staff, enabling the deposition of novel materials as required by internal projects and external customers. The TFL laboratory collaborates with the largest vacuum technology industry among the Baltic countries: SIDRABE VACUUM, Ltd., SCHAEFFLER BALTIC, Ltd., GROGLASS, Ltd., ALFA, Inc.. The thin film deposition techniques developed at ISSP during the recent years are extensively used for thin film deposition in the framework of EU projects: H2020 CO2EXIDE, EUROFUSION, FP7 and EU Latvia (ERDF) projects as well as Competence center BKC. Laboratory is also involved in the teaching process at the University of Latvia and provides students with opportunities to participate in research activities during Bachelor, Master and Doctoral level programs.
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Thin Films Lab Institute of Solid State Physics Kengaraga street 8 LV-1063 Riga LATVIA |
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| Fax: | (+371) 67132778 |
| Phone: | (+371) 67251691 |
| Internet: | http://www.dragon.lv/tfl/ |
| Bank accounts: | |
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National State (budget only)
International (any currency)
National (only EUR) |